Tantalum Nitride Films Integrated with Transparent Conductive Oxide Substrates via Atomic Layer Deposition for Photoelectrochemical Water Splitting
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Recommended citation: Hajibabaei, H., Zandi, O., Hamann, T.W.; “Tantalum Nitride Films Integrated with Transparent Conductive Oxide Substrates via Atomic Layer Deposition for Photoelectrochemical Water Splitting” Chemical Science, 2016, 7, 6760–6767
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